公开(公告)号：US10648068B2

公开(公告)日：2020-05-12

申请号：US16313594

申请日：2018-04-12

Applicant: The Swatch Group Research and Development Ltd

Inventor： Pierry Vuille ,  Roger Cochand ,  Jean-Luc Bazin ,  Csilla Miko ,  Arne Kool

IPC: C23C14/00 ,  C23C14/48 ,  G02B1/113 ,  G02B1/12 ,  H01J37/32

Abstract: A method for single or multiply charged ion implantation into a surface of a treated object, and a device for implementing the implantation method, the method including: directing towards the surface of the treated object an ion beam produced by an ion source of the electronic cyclotron resonance type; producing at least one primary electron beam and directing the primary electron beam so that it passes through the ion beam; and producing a secondary electron beam by reflecting the primary electron beam onto a target once the primary electron beam has traversed the ion beam, the target being oriented such that the secondary electron beam falls onto the surface of the treated object.