公开(公告)号：US20180294136A1

公开(公告)日：2018-10-11

申请号：US15570638

申请日：2016-05-08

Applicant: TECHNION RESEARCH & DEVELOPMENT FOUNDATION LIMITED

Inventor： Ido KAMINER ,  Maor MUTZAFI ,  Gal HARARI ,  Mordechay SEGEV

IPC: H01J37/153

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/263 ,  H01J2237/1538 ,  H01J2237/2614

Abstract: An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.