Abstract:
MQW devices, IC chips and methods may be used in semiconductor lithography patterning systems. An MQW device includes an array of pixels that have transmission elements and associated support circuits. The support circuits have preliminary memory cells and final memory cells. The final memory cells store transmittance values that control transmittances of the associated transmission elements. This way, exposure of a target with a lithography system for purposes of patterning the target may be performed through the transmission elements according to the controlled transmittances, while subsequent transmittance values are being received by the preliminary memory cells from memory banks. The exposure of the target therefore needs to pause for less time, in order to wait for the MQW device to be refreshed with the subsequent transmittance values. Accordingly the whole semiconductor lithography patterning system may operate faster and thus have more throughput.
Abstract:
Provided are an imaging device implementing pseudo correlated double sampling (CDS), and an imaging method and a control method of the image device. The imaging device includes: a pixel array comprising a pixel configured to generate a current in response to incident light; a readout circuit configured to read out a plurality of output signals of the pixel, the plurality of output signals corresponding to a plurality of consecutive integration periods of the pixel within an aggregating period; and an aggregator configured to aggregate the plurality of output signals read out by the readout circuit to obtain a final aggregated output corresponding to illuminance for the aggregating period, wherein the readout circuit is configured to read out the plurality of output signals by, for each output signal, sampling a signal voltage of the pixel and sampling a subsequent reset voltage of the pixel and obtaining a difference therebetween.
Abstract:
Imaging systems, such as time-of-flight imaging systems, and methods with pixel sensitivity adjustments. An embodiment includes a method, comprising: for a plurality of pixels having a first output and a second output, measuring the first outputs and the second outputs in response to a demodulation signal; and adjusting the demodulation signal such that a combination of the first outputs is substantially similar to a combination of the second outputs.