公开(公告)号：US20150277605A1

公开(公告)日：2015-10-01

申请号：US14622100

申请日：2015-02-13

Applicant: Samsung Display Co., Ltd. ,  DONGWOO FINE-CHEM CO., LTD.

Inventor： Soo-Min AN ,  Young-Jin YOON ,  Soo-Guy RHO ,  Sang-Duck PARK ,  Kang-Bin YI ,  Jung-Bo LEE ,  Sang-Hun CHO ,  Gi-Yong NAM ,  Young-Joon CHIN ,  Sang-Tae KIM ,  Yong-Seok CHOI

IPC: G06F3/041

CPC classification number: G06F3/041 ,  G06F3/044 ,  G06F2203/04103 ,  Y10T29/49002

Abstract: Disclosed is a touch screen panel, including: a glass substrate including an active area and a non-active area; enhancement layers formed on upper and lower surfaces of the glass substrate; sensing patterns disposed on a surface of one of the enhancement layers in the active area; and sensing lines disposed in the non-active area, and electrically connected with the sensing patterns. Here, a side surface of the glass substrate may include a plurality of blunt areas depressed in a shape of a curved surface.

Abstract translation: 公开了一种触摸屏面板，包括：玻璃基板，包括有源区域和非有源区域; 增强层形成在玻璃基板的上表面和下表面上; 设置在所述有效区域中的所述增强层之一的表面上的感测图案; 以及设置在非有源区域中的感测线，并且与感测图案电连接。 这里，玻璃基板的侧面可以包括以弯曲表面形状凹陷的多个钝区。

公开(公告)号：US20160096201A1

公开(公告)日：2016-04-07

申请号：US14809028

申请日：2015-07-24

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun KIM ,  Young-Min MOON ,  Soo-Min AN

IPC: B08B3/02 ,  H01L21/02 ,  B08B3/08

Abstract: A substrate-treating apparatus includes a liquid-providing part, a first liquid-removing knife and a returning part. The liquid-providing part provides a first liquid chemical for cleaning a substrate that includes a metal pattern and a photoresist pattern on the metal pattern, and for removing an etchant that remains on the substrate. The first liquid-removing knife sprays a second liquid chemical in a direction inclined and opposite to a returning direction of the substrate, so as to remove the first liquid chemical, the first liquid chemical including a metal precipitate. The returning part returns the substrate from the liquid-providing part toward the first liquid-removing knife in the returning direction.

Abstract translation: 基板处理装置包括液体供给部，第一除液刀和​​返回部。 液体提供部分提供用于清洁在金属图案上包括金属图案和光刻胶图案的基板的第一液体化学品，以及用于去除残留在基板上的蚀刻剂。 第一除液刀沿与基板的返回方向倾斜并相反的方向喷射第二液体化学品，以除去第一液体化学品，第一液体化学品包括金属沉淀物。 返回部件使返回方向从液体供给部向第一除液刀返回基板。