公开(公告)号：US08617944B2

公开(公告)日：2013-12-31

申请号：US13783083

申请日：2013-03-01

Applicant: Samsung Display Co., Ltd.

Inventor： Byeong-Jin Lee ,  Hong-Sik Park ,  Sang-Tae Kim ,  Joon-Woo Lee ,  Young-Chul Park ,  Young-Jun Jin ,  Suck-Jun Lee ,  Seung-Jae Yang ,  O-Byoung Kwon ,  In-Ho Yu ,  Sang-Hoon Jang ,  Min-Ki Lim ,  Hye-Ra Shin ,  Yu-Jin Lee

IPC: H01L21/00 ,  H01L21/302

CPC classification number: H01L29/401 ,  C09K13/06 ,  H01L27/124 ,  H01L31/022475 ,  H01L31/022483 ,  H01L31/1884 ,  Y02E10/50

Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.

Abstract translation: 提供了用于蚀刻透明电极的蚀刻剂组合物，蚀刻剂组合物包括无机酸，含铵（NH 4 +）的化合物，环胺化合物和剩余量的水。