PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS
    2.
    发明申请
    PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
    等离子体增强化学蒸气沉积装置

    公开(公告)号:US20170002468A1

    公开(公告)日:2017-01-05

    申请号:US15049162

    申请日:2016-02-22

    Abstract: A plasma enhanced chemical vapor deposition (PECVD) apparatus including a chamber; an upper electrode in the chamber; a spray unit in the upper electrode to spray a gas introduced from outside the chamber toward a substrate inside the chamber; a susceptor on which the substrate is mountable; a plurality of mask supports in a mask frame at an edge of the susceptor, the mask supports being formed of a conductive material that provides elastic force by supporting a mask to maintain and control a level of the mask; and a power supply unit to supply power to the upper electrode.

    Abstract translation: 包括腔室的等离子体增强化学气相沉积(PECVD)装置; 室中的上电极; 上部电极中的喷射单元,用于将从室外引入的气体朝向室内的基板喷射; 可以安装基板的基座; 在基座的边缘处的掩模框架中的多个掩模支撑件,所述掩模支撑件由导电材料形成,所述导电材料通过支撑掩模来提供弹性力以维持和控制所述掩模的水平; 以及向上部电极供电的电源单元。

    INKJET PRINTING APPARATUS
    3.
    发明申请

    公开(公告)号:US20250058565A1

    公开(公告)日:2025-02-20

    申请号:US18630473

    申请日:2024-04-09

    Abstract: An inkjet printing apparatus includes: a plurality of inkjet heads configured to discharge ink, a supply storage device configured to supply the ink to the plurality of inkjet heads, a plurality of supply flow paths configured to move the ink from the supply storage device to the plurality of inkjet heads, a plurality of discharge flow paths configured to move the ink from the plurality of inkjet heads to the supply storage device, and a plurality of by-pass lines directly connecting the plurality of supply flow paths with the plurality of discharge flow paths.

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