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公开(公告)号：US20240290590A1
公开(公告)日：2024-08-29
申请号：US18520360
申请日：2023-11-27
Applicant: Samsung Display Co., LTD.
Inventor： YOUNGGIL PARK , JAE-HO EO
CPC classification number: H01J37/32972 , H01J37/023 , H01J37/226
Abstract: A plasma monitoring system includes a gate valve disposed on a first side of a chamber, where the gate valve is opened or closed in conjunction with a plasma monitoring operation, a viewport structure disposed outside the chamber and including a plurality of light transmitting parts, and an optical emission spectroscopy disposed outside the chamber, where the optical emission spectroscopy monitors plasma by receiving plasma light transmitted through at least one of the plurality of light transmitting parts of the viewport structure.
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