公开(公告)号：US20240168372A1

公开(公告)日：2024-05-23

申请号：US18518551

申请日：2023-11-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Deokyoung KANG ,  Youngchul KWAK ,  Serim RYOU ,  Seong-Jin PARK ,  Seon Min RHEE ,  Jaewon YANG ,  Eunju KIM ,  Hyeok LEE

IPC: G03F1/72 ,  G06T7/564

CPC classification number: G03F1/72 ,  G06T7/564 ,  G06T2207/10032 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: A method and apparatus for estimating a resist image (RI) are disclosed. The method includes obtaining an aerial image (AI) and a first RI from a mask image (MI), obtaining a second RI from the AI, and obtaining a third RI based on the first RI and the second RI.