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公开(公告)号:US10961364B2
公开(公告)日:2021-03-30
申请号:US15779677
申请日:2016-07-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Byung-ha Park , Nak-hyun Kim , Yong-suk Cho , Cheol Ham
IPC: C08J5/18 , C08J5/06 , C08L33/12 , C08L79/08 , C08K3/22 , C08K3/36 , B32B27/08 , B32B27/18 , B32B27/36 , B32B7/12 , B32B27/30 , C08J7/04 , G06F3/041 , B32B27/28 , C09J5/06 , C09J183/04
Abstract: Disclosed is a cover window for protecting a display panel. The present cover window comprises: a transparent sheet through which light of the display panel passes, the transparent sheet including nano-inorganic particles; and a coating layer disposed on the transparent sheet.
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公开(公告)号:US10809423B2
公开(公告)日:2020-10-20
申请号:US15440128
申请日:2017-02-23
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Cheol Ham , In-oh Hwang , Byung-ha Park , Soo-jin Park , Seung-hoon Kal , Myung-gon Kim , Saim Saher , Jin-wook Lee
IPC: C09D183/06 , G02B1/18 , C09D5/16 , C09D183/04 , G02B1/10 , G02B27/00 , G02B1/14 , C09D5/00 , C08G77/18 , C08K5/5419
Abstract: A coating film to prevent a conspicuous fingerprint has a water contact angle of no less than 60° so that most of water contained in fingerprints on the coating film evaporates without forming a layer adsorbed on the coating film. Further, the coating film has lipophilicity and has a diiodomethane contact angle of no more than 45° so that the coating film exhibits enhanced affinity to fingerprints, which primarily contain oily components.
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公开(公告)号:US20230383218A1
公开(公告)日:2023-11-30
申请号:US18324260
申请日:2023-05-26
Applicant: Samsung Electronics Co., Ltd.
Inventor: Byungjoon Kang , Jiwon Kim , Sungmin Kim , Hwang Suk Kim , Jungmin Oh , Hyosan Lee , Byoungki Choi , Cheol Ham , Kyuyoung Hwang
CPC classification number: C11D7/265 , C11D11/0047
Abstract: A cleaning composition for removing residues on surfaces contains a solvent and a cleaning accelerator, but does not contain an oxidant, wherein the cleaning accelerator includes at least one of a salt represented by Formula 1A or a salt represented by Formula 1B. A method of cleaning a metal-containing film includes preparing the cleaning composition, and bring the cleaning composition into contact with a metal-containing film provided on a substrate, the metal-containing film having a surface on which residues are generated. The Formulae 1A and 1B are:
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