公开(公告)号：US20170239927A1

公开(公告)日：2017-08-24

申请号：US15433469

申请日：2017-02-15

Applicant: Nokia Technologies Oy

Inventor： Richard White ,  Chris Bower ,  Joe Bottomley ,  Yinglin Liu ,  Zoran Radivojevic

IPC: B32B37/00

CPC classification number: B32B37/025 ,  B32B2313/04 ,  B32B2333/12 ,  H01L21/67144 ,  H01L21/68 ,  H01L21/6838

Abstract: A thin film manipulator comprising: a porous thin film manipulator interface with a chamber surface and an opposing thin film surface, the porous thin film manipulator interface having a through-thickness porosity to allow a fluid to be used to develop a pressure difference between the chamber surface and the opposing thin film surface; and a plurality of chambers positioned laterally across the chamber surface of the porous thin film manipulator interface, the plurality of chambers configured to allow: progressive removal of fluid laterally across the interface to provide a lateral pressure gradient which progressively decreases the pressure laterally across the thin film surface to progressively hold a thin film at the thin film surface and/or progressive application of fluid laterally across the interface to provide a lateral pressure gradient which progressively increases the pressure laterally across the thin film surface to progressively release an adhered thin film from the thin film surface.