公开(公告)号：US20240339548A1

公开(公告)日：2024-10-10

申请号：US18628296

申请日：2024-04-05

Applicant: Korea Advanced Institute of Science And Technology

Inventor： Jun-Bo YOON ,  Beom-Jun KIM ,  Min-Seung JO ,  Mikiko ITO ,  Byungkee LEE

IPC: H01L31/0236

CPC classification number: H01L31/02363

Abstract: The present disclosure relates to an anti-reflective nanostructure and a method of manufacturing the same, and more particularly, to an anti-reflective nanostructure having a refractive index close to a quintic refractive index profile and exhibiting an anti-reflection effect in which a reflectance is close to almost 0.
The anti-reflective nanostructure according to an embodiment of the present invention includes: a base part having a top surface; and a plurality of nanostructures arranged in a first direction on the top surface and each having a shape in which an upper portion has a thin and sharp shape, a lower portion has a width greater than that of the upper portion, and the width gradually increases in a direction from the upper portion to the lower portion.