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公开(公告)号：US20220326603A1
公开(公告)日：2022-10-13
申请号：US17698427
申请日：2022-03-18
Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
Inventor： Hyeong Keun KIM , Seul Gi KIM , Hyun Mi KIM , Jin Woo CHO , Yong Kyung KIM
IPC: G03F1/64
Abstract: A pellicle for extreme ultraviolet lithography containing molybdenum carbide is disclosed. The pellicle includes a substrate having an opening formed in a central portion, and a pellicle layer formed on the substrate to cover the opening and including a molybdenum carbide containing layer that contains molybdenum carbide expressed as MoC1-x (0
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