公开(公告)号：US20170046471A1

公开(公告)日：2017-02-16

申请号：US15230836

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Yin Xu ,  Wenfei Gu ,  Rui-fang Shi

IPC: G06F17/50 ,  G06T7/00

CPC classification number: G06T7/0006 ,  G06T2207/30148

Abstract: Disclosed are methods and apparatus for providing feature classification for inspection of a photolithographic mask. A design database for fabrication of a mask includes polygons that are each defined by a set of vertices. Any of the polygons that abut each other are grouped together. Any grouped polygons are healed so as to eliminate interior edges of each set of grouped polygons to obtain a polygon corresponding to a covering region of such set of grouped polygons. Geometric constraints that specify requirements for detecting a plurality of feature classes are provided and used for detecting a plurality of feature classes in the polygons of the design database. The detected features classes are used to detect defects in the mask.

Abstract translation: 公开了用于提供用于检查光刻掩模的特征分类的方法和装置。 用于制造掩模的设计数据库包括由一组顶点限定的多边形。 彼此相邻的任何多边形组合在一起。 愈合任何分组的多边形，以消除每组分组多边形的内部边缘，以获得对应于这组分组多边形的覆盖区域的多边形。 提供了用于检测多个要素类的要求的几何约束，并用于检测设计数据库的多边形中的多个要素类。 检测到的特征类用于检测掩模中的缺陷。

公开(公告)号：US10140698B2

公开(公告)日：2018-11-27

申请号：US15230836

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Yin Xu ,  Wenfei Gu ,  Rui-fang Shi

IPC: G06T7/00

Abstract: Disclosed are methods and apparatus for providing feature classification for inspection of a photolithographic mask. A design database for fabrication of a mask includes polygons that are each defined by a set of vertices. Any of the polygons that abut each other are grouped together. Any grouped polygons are healed so as to eliminate interior edges of each set of grouped polygons to obtain a polygon corresponding to a covering region of such set of grouped polygons. Geometric constraints that specify requirements for detecting a plurality of feature classes are provided and used for detecting a plurality of feature classes in the polygons of the design database. The detected features classes are used to detect defects in the mask.