SPECTRA DELTA METROLOGY
    1.
    发明申请

    公开(公告)号:US20250123225A1

    公开(公告)日:2025-04-17

    申请号:US18613874

    申请日:2024-03-22

    Abstract: An inspection system may receive first measurement data of training samples after a first process step with an in-line measurement sub-system, where the first process step is prior to fabrication of a test feature on the one or more training samples; and receive second measurement data of the test feature after a second process step, where the second process step is after fabrication of the test feature. An inspection system may determine delta metrics associated with the first and second measurement data for the test feature. An inspection system may generate a measurement model for determining metrology measurements of the test feature based on at least one of the second measurement data or the delta metrics. An inspection system may determine values of the metrology measurements for additional instances of the test feature based on at least one of the second measurement data or the delta metrics.

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