公开(公告)号：US20250053096A1

公开(公告)日：2025-02-13

申请号：US18231181

申请日：2023-08-07

Applicant: KLA Corporation

Inventor： Houssam Chouaib ,  Tianrong Zhan ,  Jonathan Iloreta ,  Teng Gu ,  Andrei V. Shchegrov

IPC: G03F7/00

Abstract: Methods and systems for generating measurement models of complex semiconductor structures based on re-useable, parametric models are presented herein. In some embodiments, the re-useable, parametric models enable measurement of high aspect ratio (HAR) structures having complex shape profiles. In these embodiments, a re-useable, parametric model includes multiple geometric sections each characterized by a different shape profile. Each shape profile is parameterized by at least one shape parameter. In a further aspect, at least one of the multiple geometric sections includes a plurality of subsections. In some other embodiments, the re-useable, parametric models enable measurement of nanowire based semiconductor structures. The re-useable, parametric models described herein are useful for generating measurement models for both optical metrology and x-ray metrology, e.g., soft x-ray metrology and hard x-ray metrology. The resulting measurement models yield more accurate measurement results with improved robustness.

公开(公告)号：US20240377758A1

公开(公告)日：2024-11-14

申请号：US18196219

申请日：2023-05-11

Applicant: KLA Corporation

Inventor： Houssam Chouaib ,  HaoMiao Chang ,  Teng Gu ,  Tianrong Zhan ,  Andrew Lagodzinski ,  Zhengquan Tan

IPC: G03F7/00

Abstract: An inspection system includes a controller including a memory maintaining program instructions and one or more processors configured to execute the program instructions. The program instructions cause the one or more processors to generate a geometric model of a structure of a sample, generate an optical response function model of the structure of the sample to illumination based at least in part on the geometric model, receive measured data from a detector, generate a parametric sub-structure model based on at least the optical response function model and the measured data, and extract one or more parameters of the structure based on the measured data.