公开(公告)号：US20250076185A1

公开(公告)日：2025-03-06

申请号：US18812890

申请日：2024-08-22

Applicant: KLA Corporation

Inventor： Janardan Nath ,  Shankar Krishnan ,  Harish Kashyap

IPC: G01N21/21

Abstract: Methods and systems for performing spectroscopic ellipsometry (SE) measurements of semiconductor structures based on data sets resolved in wavelength, azimuth angle, and angle of incidence are presented herein. In some embodiments, machine learning based measurement models are trained to infer estimated values of one or more parameters of interest characterizing a structure under measurement based on SE measurement data resolved in wavelength, azimuth angle, and angle of incidence. In some other embodiments, regression is performed on a physics based measurement model to estimate values of one or more parameters of interest characterizing a structure under measurement. A dispersive element in the collection beam path disperses collected light across the active surface of a detector to resolve collected light according to wavelength and one angular dimension. Furthermore, multiple images are collected by the detector to resolve collected light across the other angular dimension.