公开(公告)号：US10421883B2

公开(公告)日：2019-09-24

申请号：US15386502

申请日：2016-12-21

Applicant: KCTECH CO., LTD.

Inventor： Jang Kuk Kwon ,  Sung Pyo Lee ,  Chang Gil Kwon ,  Jun Ha Hwang

IPC: C09G1/02 ,  C09G1/04 ,  C09K3/14 ,  H01L21/304 ,  H01L21/3105 ,  H01L21/321

Abstract: An abrasive particle-dispersion layer composite and a polishing slurry composition including the abrasive particle-dispersion layer composite are provided. The abrasive particle-dispersion layer composite includes abrasive particles, a first dispersant that is at least one cationic compound among an amino acid, an organic acid, polyalkylene glycol and a high-molecular polysaccharide coupled to a glucosamine compound, and a second dispersant that is a cationic polymer including at least two ionized cations in a molecular formula.