ADAPTIVE ENDPOINT DETECTION FOR AUTOMATED DELAYERING OF SEMICONDUCTOR SAMPLES

    公开(公告)号:US20210287938A1

    公开(公告)日:2021-09-16

    申请号:US16816695

    申请日:2020-03-12

    申请人: FEI Company

    IPC分类号: H01L21/768 G03F1/84 H01L21/02

    摘要: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.