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公开(公告)号:US11171048B2
公开(公告)日:2021-11-09
申请号:US16816695
申请日:2020-03-12
申请人: FEI Company
IPC分类号: H01L21/768 , H01L21/02 , G03F1/84
摘要: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.
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公开(公告)号:US20210287938A1
公开(公告)日:2021-09-16
申请号:US16816695
申请日:2020-03-12
申请人: FEI Company
IPC分类号: H01L21/768 , G03F1/84 , H01L21/02
摘要: Adaptive endpoint detection is applied to delayering of a multi-layer sample utilizing a combination of dynamic and predetermined parameters. Tuned predetermined parameters, varying between layers of the sample, allow automated operation across multiple sites of a device. A semiconductor logic device is described, having a zone of thick metal layers and a zone of thin metal layers. The described techniques can be integrated with analysis operations and can be applied across a wide range of device types and manufacturing processes.
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