Abstract:
An electroluminescent PN-junction diode containing isoelectronic traps is fabricated with a relatively high concentration of such traps located within a few diffusion lengths of the PN-junction and a relatively low concentration of such traps farther away from the junction. Thereby, absorption by such traps away from the junction, of radiation emitted at such traps at the junction, is minimized. In particular, a method is described for epitaxially growing such a gallium phosphide PN-junction diode with a higher concentration of isoelectronic nitrogen traps near the junction than elsewhere in the diode.