公开(公告)号：US20220392774A1

公开(公告)日：2022-12-08

申请号：US17887206

申请日：2022-08-12

Applicant: Applied Materials, Inc.

Inventor： Akhil MEHROTRA ,  Gene S. LEE ,  Abhijit PATIL ,  Shan JIANG ,  Zohreh HESABI

IPC: H01L21/3213 ,  H01L21/285 ,  H01L21/3065 ,  H01L21/311

Abstract: A method of removing a metal-containing layer (e.g., tungsten) from a substrate is provided. The method includes generating a first plasma in a process volume of a plasma chamber when a patterned device is disposed on a substrate support in the process volume. The patterned device includes a patterned region and an unpatterned region; a substrate; a tungsten-containing layer formed over the substrate; a supporting layer disposed between the tungsten-containing layer and the substrate. The patterned region includes exposed surfaces of the supporting layer and the unpatterned region does not include any exposed surfaces of the supporting layer. The method further includes depositing a first film over the patterned region of the tungsten-containing layer with the first plasma; and removing portions of the unpatterned region of the tungsten-containing layer with the first plasma without depositing the first film over the unpatterned region.

公开(公告)号：US20210193481A1

公开(公告)日：2021-06-24

申请号：US17197757

申请日：2021-03-10

Applicant: Applied Materials, Inc.

Inventor： Akhil MEHROTRA ,  Gene S. LEE ,  Abhijit PATIL ,  Shan JIANG ,  Zohreh HESABI

IPC: H01L21/3213 ,  H01L21/285 ,  H01L21/3065 ,  H01L21/311

Abstract: A method of removing a metal-containing layer (e.g., tungsten) from a substrate is provided. The method includes generating a first plasma in a process volume of a plasma chamber when a patterned device is disposed on a substrate support in the process volume. The patterned device includes a patterned region and an unpatterned region; a substrate; a tungsten-containing layer formed over the substrate; a supporting layer disposed between the tungsten-containing layer and the substrate. The patterned region includes exposed surfaces of the supporting layer and the unpatterned region does not include any exposed surfaces of the supporting layer. The method further includes depositing a first film over the patterned region of the tungsten-containing layer with the first plasma; and removing portions of the unpatterned region of the tungsten-containing layer with the first plasma without depositing the first film over the unpatterned region.