公开(公告)号：US20250123163A1

公开(公告)日：2025-04-17

申请号：US18913965

申请日：2024-10-11

Applicant: Apple Inc.

Inventor： Shyamal Kishore ,  Fred Y. Chou ,  Joseph R. Lee ,  Emre Olceroglu ,  Habib S. Karaki ,  James C. Clements

IPC: G01L1/22

Abstract: Dual loop strain gauge architectures (or other multiple loop strain gauge architectures) are used to sense an amount of force applied to an electronic device. The force may be applied by a transverse, uneven pressure field, such as a force that is applied by an amorphous object and/or a force that is applied non-uniformly, over a large area and/or to multiple points or areas. In some embodiments, a dual loop (or other multiple loop) strain gauge architecture is used to sense a pressure distribution on an electronic device. In some embodiments, a single loop strain gauge architecture is used to sense an amount of force applied to an electronic device.