公开(公告)号：US10300557B2

公开(公告)日：2019-05-28

申请号：US15712646

申请日：2017-09-22

Applicant: Apple Inc.

Inventor： Nathan K. Gupta ,  Simon R. Lancaster-Larocque ,  Prithu Sharma ,  Weibo Cheng ,  Abhijit A. Kangude ,  Bryan W. Posner ,  Sudirukkuge T. Jinasundera ,  Karan Bir

IPC: B23K26/36 ,  B23K26/00 ,  B23K26/08 ,  B23K26/0622 ,  B23K26/53 ,  B23K103/00

Abstract: A hybrid laser modulation and acid etch process for the creation of a patterned substrate. According to some embodiments, a hole is formed in a glass substrate by first modulating a portion of the substrate in the desired shape. A mask is coated on the glass substrate and is patterned to expose the modulated portion. The glass substrate is then acid etched to remove the modulated portion. Once the modulated portion has been etched, the desired shape may be removed from the glass substrate and the mask may be stripped.

公开(公告)号：US20180085857A1

公开(公告)日：2018-03-29

申请号：US15712646

申请日：2017-09-22

Applicant: Apple Inc.

Inventor： Nathan K. Gupta ,  Simon R. Lancaster-Larocque ,  Prithu Sharma ,  Weibo Cheng ,  Abhijit A. Kangude ,  Bryan W. Posner ,  Sudirukkuge T. Jinasundera ,  Karan Bir

IPC: B23K26/36 ,  B23K26/0622 ,  B23K26/00 ,  B23K26/08

CPC classification number: B23K26/36 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/08 ,  B23K26/53 ,  B23K2103/54

Abstract: A hybrid laser modulation and acid etch process for the creation of a patterned substrate. According to some embodiments, a hole is formed in a glass substrate by first modulating a portion of the substrate in the desired shape. A mask is coated on the glass substrate and is patterned to expose the modulated portion. The glass substrate is then acid etched to remove the modulated portion. Once the modulated portion has been etched, the desired shape may be removed from the glass substrate and the mask may be stripped.