公开(公告)号：US20130201466A1

公开(公告)日：2013-08-08

申请号：US13791477

申请日：2013-03-08

Applicant: ASML Netherlands B.V.

Inventor： Richard Alexander GEORGE ,  Cheng-Qun Gui ,  Pieter Willem Herman De Jager ,  Robbert Edgar Van Leeuwen ,  Jacobus Burghoorn

IPC: G03B27/53

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.