再颁专利
USRE39573E1 Antimutagenic compositions for treatment and prevention of photodamage to skin
失效
用于治疗和预防皮肤光损伤的抗诱变组合物
- 专利标题: Antimutagenic compositions for treatment and prevention of photodamage to skin
- 专利标题(中): 用于治疗和预防皮肤光损伤的抗诱变组合物
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申请号: US10887555申请日: 2004-07-09
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公开(公告)号: USRE39573E1公开(公告)日: 2007-04-17
- 发明人: Reid W. von Borstel , Fedor Romantsev
- 申请人: Reid W. von Borstel , Fedor Romantsev
- 申请人地址: US MD Gaithersburg
- 专利权人: Wellstat Therapeutics Corporation
- 当前专利权人: Wellstat Therapeutics Corporation
- 当前专利权人地址: US MD Gaithersburg
- 代理机构: Nixon & Vanderhye
- 主分类号: A61K31/70
- IPC分类号: A61K31/70
摘要:
A method of improving DNA repair and reducing DNA damage and for reducing mutation frequency in skin for the purpose of reducing consequences of exposure to solar or ultraviolet radiation is disclosed. The methods comprise administering to the skin a composition containing deoxyribonucleosides in concentrations sufficient to enhance DNA repair or reduce mutation frequency in a vehicle capable of delivering effective amounts of deoxyribonucleosides to the necessary skin cells.
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