A punch centering block device can include a first block and a second block. The first block can define a first reference surface and a first notch extending along a first axis. The first reference surface can lay flush on a workpiece. The first axis can be transverse to the first reference surface. The second block can define a second reference surface and a second notch extending along a centered second axis. The second reference surface can lay flush on the workpiece. The second axis can be transverse to the second reference surface. The first block and the second block can selectively abut one another and render the first axis and second axis collinear to receive a punch. The punch is slidable against the first notch and the second notch during the marking operation.