- 专利标题: Demountable interconnect structure
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申请号: US12061141申请日: 2008-04-02
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公开(公告)号: US09953910B2公开(公告)日: 2018-04-24
- 发明人: Charles Gerard Woychik , Raymond Albert Fillion
- 申请人: Charles Gerard Woychik , Raymond Albert Fillion
- 申请人地址: US NY Schenectady
- 专利权人: General Electric Company
- 当前专利权人: General Electric Company
- 当前专利权人地址: US NY Schenectady
- 代理机构: Ziolkowski Patent Solutions Group, SC
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L23/00 ; H01L23/538
摘要:
An electronic component includes a base insulative layer having first and second surfaces; an electronic device having first and second surfaces; at least one I/O contact located on the first surface of the electronic device; an adhesive layer disposed between the first surface of the electronic device and the second surface of the base insulative layer; a first metal layer disposed on the I/O contact; and a removable layer disposed between the first surface of the electronic device and the second surface of the base insulative layer, and located adjacent to the first metal layer. The base insulative layer secures to the electronic device through the first metal layer and removable layer. The first metal layer and removable layer can release the base insulative layer from the electronic device when the first metal layer and removable layer are exposed to a temperature higher than their softening points or melting points.
公开/授权文献
- US20080318027A1 DEMOUNTABLE INTERCONNECT STRUCTURE 公开/授权日:2008-12-25
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