- 专利标题: Gas-adsorbing material and vacuum insulation material including the same
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申请号: US14939892申请日: 2015-11-12
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公开(公告)号: US09901900B2公开(公告)日: 2018-02-27
- 发明人: Nagahisa Sato , Ryosuke Kamitani , Kenichi Nagayama
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Gyeonggi-Do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: JP2014-230823 20141113; KR10-2015-0056034 20150421; JP2015-138163 20150709
- 主分类号: B01J20/18
- IPC分类号: B01J20/18 ; B01D53/02 ; B01J20/28 ; B01D53/04 ; F16L59/065
摘要:
A gas-adsorbing material may increase gas barrier properties for a target gas by reducing a gas-adsorption rate while maintaining gas-adsorption performance. A vacuum insulation material may use the gas-adsorbing material. The gas-adsorbing material may include a gas-adsorbing composition including a copper ion exchanged ZSM-5-type zeolite having a silica to alumina ratio ranging from about 10 to 50 in a framework of zeolite. A ratio of dealuminization of the ZSM-5-type zeolite is at least about 15%, and the gas-adsorbing material is capable of adsorbing at least nitrogen. Furthermore, the gas-adsorbing material may include a calcinated body of a compressed article comprising a gas-adsorbing composition including a copper ion exchanged ZSM-5-type zeolite having a silica to alumina ratio ranging from about 10 to 50 in a framework of zeolite (where a ratio of dealuminization of the ZSM-5-type zeolite is at least about 15%) and a moisture-absorbing material.
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