Invention Grant
- Patent Title: Method for measuring the concentration of a photoresist in a stripping liquid
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Application No.: US14647100Application Date: 2014-05-23
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Publication No.: US09797828B2Publication Date: 2017-10-24
- Inventor: Li Wang
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- Applicant Address: CN Shenzhen
- Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
- Current Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD
- Current Assignee Address: CN Shenzhen
- Priority: CN201410118203 20140327
- International Application: PCT/CN2014/078266 WO 20140523
- International Announcement: WO2015/143768 WO 20151001
- Main IPC: G01J3/00
- IPC: G01J3/00 ; G01N21/33 ; G01N1/38 ; G01N21/31

Abstract:
The present invention discloses a method for measuring the concentration of a photoresist in a stripping liquid. In the method for measuring the concentration of a photoresist in a stripping liquid, a plurality of standard photoresist samples are prepared at first, then the spectrum of the standard photoresist samples and the spectrum of the test photoresist sample are collected, and the nth derivative of the spectrum of the standard photoresist samples and the spectrum of the test photoresist sample are taken, wherein n is an integer equal to or greater than 1, a standard curve based on the nth derivative curves and calculating the concentration of the test photoresist sample is established, the concentration of a photoresist in a stripping liquid can be measured accurately according to the standard curve.
Public/Granted literature
- US20170003216A1 METHOD FOR MEASURING THE CONCENTRATION OF A PHOTORESIST IN A STRIPPING LIQUID Public/Granted day:2017-01-05
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