Invention Grant
- Patent Title: Resistive random access memory (RRAM) structure
-
Application No.: US15167905Application Date: 2016-05-27
-
Publication No.: US09780145B2Publication Date: 2017-10-03
- Inventor: Chih-Yang Chang , Wen-Ting Chu , Kuo-Chi Tu , Yu-Wen Liao , Hsia-Wei Chen , Chin-Chieh Yang
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/788 ; H01L27/24 ; H01L45/00

Abstract:
A resistive random access memory (RRAM) cell comprises a transistor having a gate and a source/drain region, a bottom electrode coplanar with the gate, a resistive material layer over the bottom electrode, a top electrode over the resistive material layer, and a conductive material electrically connecting the bottom electrode to the source/drain region.
Public/Granted literature
- US20160276408A1 RESISTIVE RANDOM ACCESS MEMORY (RRAM) STRUCTURE Public/Granted day:2016-09-22
Information query
IPC分类: