- 专利标题: Apparatus and method for generating high current negative hydrogen ion beam
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申请号: US14831468申请日: 2015-08-20
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公开(公告)号: US09773636B2公开(公告)日: 2017-09-26
- 发明人: W. Davis Lee , Neil Bassom , Anthony Renau
- 申请人: Varian Semiconductor Equipment Associates, Inc.
- 申请人地址: US MA Gloucester
- 专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人: Varian Semiconductor Equipment Associates, Inc.
- 当前专利权人地址: US MA Gloucester
- 主分类号: H01J37/08
- IPC分类号: H01J37/08 ; H01J37/317
摘要:
An apparatus to generate negative hydrogen ions. The apparatus may include an ion source chamber having a gas inlet to receive H2 gas; a light source directing radiation into the ion source chamber to generate excited H2 molecules having an excited vibrational state from at least some of the H2 gas; a low energy electron source directing low energy electrons into the ion source chamber, wherein H− ions are generated from at least some of the excited H2 molecules; and an extraction assembly arranged to extract the H− ions from the ion source chamber.
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