- 专利标题： Shower plate sintered integrally with gas release hole member and method for manufacturing the same
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申请号： US14542793申请日： 2014-11-17
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公开(公告)号： US09767994B2公开(公告)日： 2017-09-19
- 发明人: Masahiro Okesaku , Tadahiro Ohmi , Tetsuya Goto , Takaaki Matsuoka , Toshihisa Nozawa , Atsutoshi Inokuchi , Kiyotaka Ishibashi
- 申请人： TOKYO ELECTRON LIMITED , NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- 申请人地址： JP Tokyo JP Sendai-Shi
- 专利权人： TOKYO ELECTRON LIMITED,NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- 当前专利权人： TOKYO ELECTRON LIMITED,NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- 当前专利权人地址： JP Tokyo JP Sendai-Shi
- 代理机构： Cantor Colburn LLP
- 优先权： JP2006-287934 20061023
- 主分类号： H01J37/32
- IPC分类号： H01J37/32 ; C23C16/455
摘要：
A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 μm to 70 μm, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 μm communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.
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