Invention Grant
- Patent Title: Wafer inspection method and software
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Application No.: US14609455Application Date: 2015-01-30
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Publication No.: US09754365B2Publication Date: 2017-09-05
- Inventor: Asaf Schlezinger , Markus J. Stopper
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G06T17/10 ; G06T19/20 ; G06T17/00

Abstract:
Embodiments of the present invention generally relate to methods for inspecting wafers. After a brick is sliced into a plurality of bare wafers, a two-dimensional (2D) photoluminescence (PL) image of each wafer is taken, the PL images of the wafers in sequential order (i.e., the sequence of the wafers as they are sliced from the brick) are then combined to construct a three-dimensional (3D) model of the brick that highlights similar regions in the brick.
Public/Granted literature
- US20150243009A1 WAFER INSPECTION METHOD AND SOFTWARE Public/Granted day:2015-08-27
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