Invention Grant
- Patent Title: Substrate table system, lithographic apparatus and substrate table swapping method
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Application No.: US14388773Application Date: 2013-02-15
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Publication No.: US09753381B2Publication Date: 2017-09-05
- Inventor: Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Antonius Franciscus Johannes De Groot , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Hans Butler
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/053084 WO 20130215
- International Announcement: WO2013/143777 WO 20131003
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00 ; H02K41/02

Abstract:
A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.
Public/Granted literature
- US20150153661A1 SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD Public/Granted day:2015-06-04
Information query
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