- 专利标题: Substrate processing apparatus
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申请号: US14206902申请日: 2014-03-12
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公开(公告)号: US09721814B2公开(公告)日: 2017-08-01
- 发明人: Masanobu Sato , Hiroyuki Yashiki
- 申请人: DAINIPPON SCREEN MFG. CO., LTD
- 申请人地址: JP Kyoto
- 专利权人: SCREEN HOLDINGS CO., LTD.
- 当前专利权人: SCREEN HOLDINGS CO., LTD.
- 当前专利权人地址: JP Kyoto
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2013-049861 20130313
- 主分类号: H01L21/304
- IPC分类号: H01L21/304 ; H01L21/67
摘要:
In a substrate processing apparatus, an election head from a position above a substrate held by a substrate holding part to an inspection position above a standby pod disposed outside a cup part. At the inspection position, a processing liquid ejected from the ejection head toward the standby pod is irradiated with planar light emitted from a light emitting part. An imaging part acquires an inspection image including bright dots appearing on the processing liquid, and a determination part determines the quality of the ejection operation of the ejection head on the basis of the inspection image. Accordingly, it is possible to eliminate the influence of reflected light from the substrate and droplets, mist, or the like of the processing liquid having collided with the substrate and to accurately determine the quality of the ejection operation of the ejection head.
公开/授权文献
- US20140261586A1 SUBSTRATE PROCESSING APPARATUS 公开/授权日:2014-09-18
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