A method for polishing tooth surface which eases removal of a bacterial film later grown on the polished surface. The method includes the steps of providing a providing a toothpaste or slurry comprising a plurality of inorganic abrasive particles smaller than 100 nm in size, the inorganic abrasive particles comprising one or more of silica, ceria, titania, zirconia, silicon nitrite, and silica carbide, wherein the inorganic abrasive particles are sufficiently hard to be abrasive; and polishing a tooth surface with the toothpaste or slurry to attain an ultra-smooth tooth surface which can be easily cleaned.