- Patent Title: Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material
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Application No.: US14674724Application Date: 2015-03-31
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Publication No.: US09669334B2Publication Date: 2017-06-06
- Inventor: Igor V. Fomenkov , William N. Partlo , Gregory O. Vaschenko , William Oldham
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: A61N5/06
- IPC: A61N5/06 ; B01D29/56 ; B22F3/105 ; H05G2/00 ; H05H1/46

Abstract:
A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
Public/Granted literature
- US20150209701A1 FILTER FOR MATERIAL SUPPLY APPARATUS OF AN EXTREME ULTRAVIOLET LIGHT SOURCE Public/Granted day:2015-07-30
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