- Patent Title: Cu2Zn0.14Sn0.25Te2.34 nanocrystalline solution, its preparation method, photosensitive resin solution, method for forming black matrix, and color filter substrate
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Application No.: US14646168Application Date: 2014-11-05
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Publication No.: US09618841B2Publication Date: 2017-04-11
- Inventor: Ying Cui , Yingying Song , Ze Liu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Agency: Banner & Witcoff, Ltd.
- Priority: CN201410252354 20140609
- International Application: PCT/CN2014/090385 WO 20141105
- International Announcement: WO2015/188577 WO 20151217
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G02B5/00

Abstract:
The present invention relates to a Cu2Zn0.14Sn0.25Te2.34 nanocrystalline solution, its preparation method, a photosensitive resin solution, a method for forming black matrixes (BMs), and a color filter (CF) substrate. As the particle size of nanocrystallines in the nanocrystalline solution is small and light within the ultraviolet-visible light range can be absorbed, the BMs formed by utilization of the nanocrystalline solution can obtain good light shielding performance while having a small thickness. In the nanocrystalline solution, the particle size of the nanocrystallines dispersed in the nanocrystalline solution is 5 to 20 nm; the band gap of the nanocrystallines is 0.8 to 1.5 ev, and the grain surface of the nanocrystallines has organic functional groups.
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