Invention Grant
- Patent Title: Methods of fabricating photonic crystal
- Patent Title (中): 制造光子晶体的方法
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Application No.: US13917841Application Date: 2013-06-14
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Publication No.: US09593429B2Publication Date: 2017-03-14
- Inventor: Moon Gyu Han , Chul-Joon Heo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness Dickey & Pierce, P.L.C.
- Priority: KR10-2012-0126166 20121108
- Main IPC: C25D15/00
- IPC: C25D15/00 ; C09D4/00 ; C25B7/00 ; C25D13/02 ; C25D13/12 ; G02B6/13 ; G02B1/00 ; G02B6/122

Abstract:
Provided are a method of fabricating a photonic crystal having a desired photonic bandgap, and a method of fabricating a color filter, including providing a photonic crystal solution in which a plurality of colloidal particles that are electrically charged are dispersed, mixing a photopolymerizable monomer mixture in the photonic crystal solution to form a photopolymerizable monomer-crystal mixture, applying an electric field to the photopolymerizable monomer-crystal mixture to electrically control intervals between the plurality of colloidal particles, and irradiating ultraviolet light to the photopolymerizable monomer-crystal mixture to photopolymerize the monomer mixture to form the photonic crystal or the color filter.
Public/Granted literature
- US20140124369A1 METHODS OF FABRICATING PHOTONIC CRYSTAL Public/Granted day:2014-05-08
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