发明授权
- 专利标题: Liquid ejection apparatus and method for manufacturing liquid ejection apparatus
- 专利标题(中): 液体喷射装置及液体喷射装置的制造方法
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申请号: US14951732申请日: 2015-11-25
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公开(公告)号: US09573372B2公开(公告)日: 2017-02-21
- 发明人: Taiki Tanaka
- 申请人: BROTHER KOGYO KABUSHIKI KAISHA
- 申请人地址: JP Nagoya-shi, Aichi-Ken
- 专利权人: BROTHER KOGYO KABUSHIKI KAISHA
- 当前专利权人: BROTHER KOGYO KABUSHIKI KAISHA
- 当前专利权人地址: JP Nagoya-shi, Aichi-Ken
- 代理机构: Merchant & Gould P.C.
- 优先权: JP2014-242978 20141201
- 主分类号: B41J2/045
- IPC分类号: B41J2/045 ; B41J2/14 ; B41J2/16
摘要:
A liquid ejection apparatus and method of manufacture are disclosed. One apparatus includes a piezoelectric element corresponding to a pressure chamber in a channel substrate, a trace corresponding to the piezoelectric element. The piezoelectric element includes a piezoelectric layer, a first electrode, a second electrode disposed on a surface of the piezoelectric layer on a side opposite the channel substrate, and a protective film covering the piezoelectric layer and the second electrode. The second electrode includes a lead-out portion that extends to an area over the channel substrate where the piezoelectric layer is not disposed, and a contact portion that is provided in the lead-out portion and that is exposed from the protective film in the area. The trace is connected to the second electrode at the exposed contact portion.
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