发明授权
- 专利标题： Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
- 专利标题（中）： 浸液构件，曝光装置，曝光方法，制造装置，程序和记录介质的方法
-
申请号： US15015704申请日： 2016-02-04
-
公开(公告)号： US09557654B2公开(公告)日： 2017-01-31
- 发明人: Shinji Sato
- 申请人： NIKON CORPORATION
- 申请人地址： JP Tokyo
- 专利权人： NIKON CORPORATION
- 当前专利权人： NIKON CORPORATION
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 主分类号： G03B27/52
- IPC分类号： G03B27/52 ; G03B27/42 ; G03F7/20
摘要：
A liquid immersion exposure apparatus includes a projection system having a final element and a liquid immersion member that forms a liquid immersion space under the final element. The liquid immersion member includes a first member that surrounds the final element and that has a liquid supply port and a liquid suction port and a second member at least a portion of which is disposed below the first member, and that is movable with respect to the first member. The first member has a channel therein, one end of the channel is open to a first space between the final element and the first member, the other end of the channel is disposed below the one end and is open to a second space different from the first space, and the channel is provided such that liquid is allowed to flow into the channel.
公开/授权文献
信息查询
