Invention Grant
US09523913B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
有权
图案形成方法，光化射线敏感或辐射敏感性树脂组合物，抗蚀剂膜，电子器件的制造方法和电子器件
- Patent Title: Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
- Patent Title (中): 图案形成方法，光化射线敏感或辐射敏感性树脂组合物，抗蚀剂膜，电子器件的制造方法和电子器件
-
Application No.: US14093781Application Date: 2013-12-02
-
Publication No.: US09523913B2Publication Date: 2016-12-20
- Inventor: Keita Kato , Michihiro Shirakawa , Hidenori Takahashi , Shoichi Saitoh , Fumihiro Yoshino
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-120956 20110530; JP2012-091329 20120412
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; G03F7/038 ; G03F7/039 ; C08F220/12 ; G03F7/32
Abstract:
A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.
Public/Granted literature
Information query
IPC分类:
