发明授权
US09516730B2 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
有权
激光产生等离子体光源中缓冲气体流动稳定的系统和方法
- 专利标题： Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
- 专利标题（中）： 激光产生等离子体光源中缓冲气体流动稳定的系统和方法
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申请号： US13156188申请日： 2011-06-08
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公开(公告)号： US09516730B2公开(公告)日： 2016-12-06
- 发明人: Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
- 申请人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G21K5/00
- IPC分类号： G21K5/00 ; H05G2/00
摘要：
An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
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