Invention Grant
- Patent Title: Titanium metal production apparatus and production method for titanium metal
- Patent Title (中): 钛金属生产设备及钛金属生产方法
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Application No.: US13988625Application Date: 2011-11-16
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Publication No.: US09435007B2Publication Date: 2016-09-06
- Inventor: Gang Han , Tatsuya Shoji , Shujiroh Uesaka , Mariko Fukumaru , Maher I. Boulos , Jiayin Guo , Jerzy Jurewicz
- Applicant: Gang Han , Tatsuya Shoji , Shujiroh Uesaka , Mariko Fukumaru , Maher I. Boulos , Jiayin Guo , Jerzy Jurewicz
- Applicant Address: JP Tokyo CA Sherbrooke
- Assignee: HITACHI METALS, LTD.,TEKNA PLASMA SYSTEMS INC.
- Current Assignee: HITACHI METALS, LTD.,TEKNA PLASMA SYSTEMS INC.
- Current Assignee Address: JP Tokyo CA Sherbrooke
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-260109 20101122
- International Application: PCT/JP2011/076422 WO 20111116
- International Announcement: WO2012/070452 WO 20120531
- Main IPC: C22B34/12
- IPC: C22B34/12 ; B22F9/28 ; B22F9/26 ; F27D99/00

Abstract:
A titanium metal production apparatus is provided with (a) a first flow channel that supplies magnesium in a state of gas, (b) a second flow channel that supplies titanium tetrachloride in a state of gas, (c) a gas mixing section in which the magnesium and titanium tetrachloride in a state of gas are mixed and the temperature is controlled to be 1600° C. or more, (d) a titanium metal deposition section in which particles for deposition are arranged so as to be movable, the temperature is in the range of 715 to 1500° C., and the absolute pressure is 50 kPa to 500 kPa, and (e) a mixed gas discharge section which is in communication with the titanium metal deposition section.
Public/Granted literature
- US20130255443A1 TITANIUM METAL PRODUCTION APPARATUS AND PRODUCTION METHOD FOR TITANIUM METAL Public/Granted day:2013-10-03
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