发明授权
US09431265B2 Fin cut for tight fin pitch by two different sit hard mask materials on fin
有权
翅片上通过两种不同的坐式硬掩模材料对翅片进行切割
- 专利标题： Fin cut for tight fin pitch by two different sit hard mask materials on fin
- 专利标题（中）： 翅片上通过两种不同的坐式硬掩模材料对翅片进行切割
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申请号： US14499595申请日： 2014-09-29
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公开(公告)号： US09431265B2公开(公告)日： 2016-08-30
- 发明人: Kangguo Cheng , Ali Khakifirooz , Alexander Reznicek , Tenko Yamashita
- 申请人： International Business Machines Corporation
- 申请人地址： US NY Armonk
- 专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人： INTERNATIONAL BUSINESS MACHINES CORPORATION
- 当前专利权人地址： US NY Armonk
- 代理机构： Scully, Scott, Murphy & Presser, P.C.
- 代理商 Daniel P. Morris, Esq.
- 主分类号： H01L21/308
- IPC分类号： H01L21/308 ; H01L29/06
摘要：
Methods that enable fin cut at very tight pitch are provided. After forming a first set of paired sidewall image transfer (SIT) spacers and a second set of paired SIT spacers composed of different materials, portions of the first set of the paired SIT spacers can be selectively removed without adversely affecting the second set of the paired SIT spacers, even portions of both sets of the paired SIT spacers are exposed by the cut mask due to the different etching characteristics of the different materials.
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