Projection optics for a lithographic projection system is provided that comprises a spatial light modulator (SLM) from which radiation is reflected and directed to a projection lens that projects the radiation to a substrate. The SLM is illuminated by non telecentric off axis illumination (e.g. from laser radiation that has a spectral bandwidth of the order of 1 picometer, and the projection optics is configured for significant reduction (e.g. at least 10× reduction, 20× reduction, or 50× reduction).