发明授权
US09405189B2 Self-assembled structures, method of manufacture thereof and articles comprising the same
有权
自组装结构，其制造方法和包含该组合结构的制品
- 专利标题： Self-assembled structures, method of manufacture thereof and articles comprising the same
- 专利标题（中）： 自组装结构，其制造方法和包含该组合结构的制品
-
申请号： US14020371申请日： 2013-09-06
-
公开(公告)号： US09405189B2公开(公告)日： 2016-08-02
- 发明人: Sangho Cho , Guorong Sun , Karen L. Wooley , James W. Thackeray , Peter Trefonas, III
- 申请人： The Texas A&M University System , Rohm and Haas Electronic Materials LLC
- 申请人地址： US MA Marlborough US TX College Station
- 专利权人： ROHM AND HAAS ELECTRONIC MATERIALS LLC,THE TEXAS A&M UNIVERSITY SYSTEM
- 当前专利权人： ROHM AND HAAS ELECTRONIC MATERIALS LLC,THE TEXAS A&M UNIVERSITY SYSTEM
- 当前专利权人地址： US MA Marlborough US TX College Station
- 代理机构： Cantor Colburn LLP
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; G03F7/038 ; G03F7/004 ; G03F7/075 ; C08F293/00 ; C08G61/08 ; C09D165/00 ; C08L65/00
摘要：
Disclosed herein is a photoresist composition comprising a graft block copolymer; a solvent and a photoacid generator; where the graft block copolymer comprises a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety or a silicon containing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo deprotection and alter the solubility of the graft block copolymer; where the graft block copolymer has a bottle brush topology.
公开/授权文献
信息查询
IPC分类:
