发明授权
US09399813B2 TiAgN coating layer, TiAgN coating method and TiAgN coating apparatus 有权
TiAgN涂层,TiAgN涂层法,TiAgN涂层法等

TiAgN coating layer, TiAgN coating method and TiAgN coating apparatus
摘要:
Disclosed is a TiAgN coating layer, formed by subjecting a substrate having a surface roughness of about 0.05˜0.1 μm to plasma coating by periodically turning on/off an Ag source while a Ti source is continuously turned on in a nitrogen gas atmosphere, a TiAgN coating method, and a TiAgN coating apparatus.
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