发明授权
- 专利标题: Semiconductor epitaxial structure and light-emitting device thereof
- 专利标题(中): 半导体外延结构及其发光器件
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申请号: US14130624申请日: 2012-12-26
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公开(公告)号: US09385269B2公开(公告)日: 2016-07-05
- 发明人: Ting Mei , Naiyin Wang , Hao Li , Lei Wan
- 申请人: South China Normal University
- 申请人地址: CN Guangzhou
- 专利权人: SOUTH CHINA NORMAL UNIVERSITY
- 当前专利权人: SOUTH CHINA NORMAL UNIVERSITY
- 当前专利权人地址: CN Guangzhou
- 代理商 Chieh-Mei Wang
- 优先权: CN201210507475 20121130
- 国际申请: PCT/CN2012/001740 WO 20121226
- 国际公布: WO2014/082192 WO 20140605
- 主分类号: H01L33/06
- IPC分类号: H01L33/06 ; H01L33/14 ; H01S5/343 ; H01S5/042
摘要:
The present invention discloses an epitaxial structure for semiconductor light-emitting device, comprising an electron injection region, a hole injection region, a multi-quantum well active region, a potential barrier layer for blocking carriers, and one or more band edge shaping layers. The doping type and/or doping concentration of said band edge shaping layers are different from those of the adjacent layers. It may trim the band edge shape of the semiconductor energy band through the local built-in electric field formed as a result of adjusting the doping type, doping concentration and/or layer thickness thereof, such that the carriers in the multi-quantum well active region are distributed uniformly, the overall Auger recombination is decreased, and the effective potential barrier height of the potential barrier layer for blocking carriers is increased to reduce the drain current formed by carriers overflowing out of the multi-quantum well active region, thereby improving internal quantum efficiency. The present invention further discloses a semiconductor light-emitting device that employs said epitaxial structure, which similarly achieves the effects of reduced Auger recombination and/or decreased drain current through the trimming of the band edge shape of the energy band structure by the local built-in electric field, thereby improving internal quantum efficiency of the device.
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