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US09367910B2 Self-assemblable polymer and methods for use in lithography 有权
自组装聚合物和用于光刻的方法

Self-assemblable polymer and methods for use in lithography
Abstract:
A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.
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