Invention Grant
- Patent Title: Self-assemblable polymer and methods for use in lithography
- Patent Title (中): 自组装聚合物和用于光刻的方法
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Application No.: US14369995Application Date: 2013-01-15
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Publication No.: US09367910B2Publication Date: 2016-06-14
- Inventor: Christianus Martinus Van Heesch , Hieronymus Johannus Christiaan Meessen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/050673 WO 20130115
- International Announcement: WO2013/107740 WO 20130725
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06T7/00 ; G06T7/60 ; G06F17/50 ; G01B11/03 ; G03F7/00 ; G03F7/20

Abstract:
A method and system to analyze various dimensional parameters of a structure, such as a self-assembled block copolymer structure whether formed by graphoepitaxy or chemical epitaxy. The method involves image processing including median filtering and feature detection to determine critical dimension information, and optionally the use of a Hough transform to find periodicity values and to determine placement errors.
Public/Granted literature
- US20140363072A1 SELF-ASSEMBLABLE POLYMER AND METHODS FOR USE IN LITHOGRAPHY Public/Granted day:2014-12-11
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