发明授权
- 专利标题: Mechanically fluidized silicon deposition systems and methods
- 专利标题(中): 机械流化硅沉积系统和方法
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申请号: US14497107申请日: 2014-09-25
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公开(公告)号: US09365929B2公开(公告)日: 2016-06-14
- 发明人: Mark W. Dassel , David A. Bressler
- 申请人: Rokstar Technologies LLC
- 申请人地址: US WA Indianola
- 专利权人: ROKSTAR TECHNOLOGIES LLC
- 当前专利权人: ROKSTAR TECHNOLOGIES LLC
- 当前专利权人地址: US WA Indianola
- 代理机构: Seed IP Law Group PLLC
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/46 ; B01J8/18 ; B01J8/40 ; C23C16/442 ; C23C16/24 ; C23C16/455 ; C01B33/029 ; B01J8/30 ; B01J8/00 ; C23C16/52
摘要:
Mechanically fluidized systems and processes allow for efficient, cost-effective production of silicon. Particulate may be provided to a heated tray or pan, which is oscillated or vibrated to provide a reaction surface. The particulate migrates downward in the tray or pan and the reactant product migrates upward in the tray or pan as the reactant product reaches a desired state. Exhausted gases may be recycled.
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